Graphite Support Tray for Epitaxy & Annealing

Harog Technology is one of the biggest suppliers of semiconductor graphite parts suppliers in China. With 100,000 m2 of workshop and 500+ employees, Harog Technology has continually created value for our clients for years, while protecting the intellectual property of relative parties. We are already suppliers to both domestic and international known brands in the business and feedback has always been positive.

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Product Description

Product Advantage

• Self-owned raw materials in premium quality

• Proprietary coating and purification technologies

• Full-spectrum machining operations and comprehensive quality control measures

Technical Parameters

Datasheet of Harog’s Graphite Support Tray for Epitaxy & Annealing

Application	Graphite Purity	Tolerance	CTE	Monthly Capacity	Note
Silicon Epitaxy	≤1 ppm	±0.005mm	4.2	500 sets	Manufacturing based on customer drawings
LED Epitaxy	≤1 ppm	±0.005mm	4.0	1500 sets	Manufacturing based on customer drawings

Product Features

• High Purity: Engineered with ultra-high purity graphite, ensuring minimal contamination and optimal crystal growth conditions.

• Thermal Stability: Exhibits exceptional thermal stability, maintaining structural integrity at elevated temperatures crucial for crystal growth processes.

• Uniform Surface: Features a smooth and uniform surface, facilitating consistent crystal nucleation and growth.

Technical Advantages

• Superior Conductivity: High electrical and thermal conductivity supports efficient energy transfer, enhancing the overall efficiency of crystal growth.

• Low Expansion Coefficient: Low thermal expansion coefficient minimizes deformation during temperature fluctuations, ensuring precise dimensional control.

• Durability: Exceptional mechanical strength and resistance to wear, providing long-term reliability and reducing the need for frequent substrate replacement.

Applications

• Semiconductor Manufacturing: Used in the epitaxial growth of semiconductor materials such as silicon and gallium arsenide, crucial for producing high-performance electronic devices.

• Thin Film Deposition: Supports thin film deposition processes, providing a stable platform for uniform material deposition.

• Annealing Processes: Ideal for annealing applications, where materials need to be heated and cooled in a controlled environment to achieve desired properties.

Harog Technology's graphite support trays are designed to meet the stringent requirements of epitaxy and annealing processes, offering a reliable and high-performance solution for semiconductor and thin film manufacturing.